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Iintlobo zeemveliso
iveliso ezifakiwe

Imichiza eyenziweyo

Inkqubo yokuveliswa kweekhemikhali zebakala le-IC idinga ukulawulwa ngokungqongqo kumxholo wokungcola okwahlukeneyo ukuqinisekisa ukuzinza nokuthembeka kwemveliso. Ezi khemikhali zikholisa ukucoceka okuphezulu, okungaphezulu kwe-99.999%, ukuhlangabezana nokuqinisekisa elona zinga liphantsi lesiqulatho sobumdaka bomxholo wokungcola kwimveliso yecandelo lombane.

    Itheyibhile yeParameter

    Indawo yesicelo

    Ukuhlelwa

    Igama lemveliso

    NDIYABONA

    Imichiza eyenziweyo

    Isipili sibhityile kwicala elingasemva lewafa

    I-atomization kunye nokuncitshiswa kwe-wafer ngasemva

    Ukufakwa kwe-polysilicon kunye ne-silicon substrates

    Ukucoca i-oxide kunye nokucoca i-wafer

    Ukufakwa kwefilimu yesinyithi

    Nitrogen-silicon/oxy-silicon isokinetic etching

    Ukuchongwa okukhethiweyo kwe-indium gallium zinc oxide

    Ukuchongwa okukhethiweyo kwe-nitrogen-silicon/oxy-silicon

    I-SiN/AlO, ukhetho olukhethiweyo lwe-SiN/TiN

    I-Phosphoric acid additives, i-CMP abrasives

    Isizukulwana esitsha se-HK ye-etching fluids

    Ukukhutshwa kwe-molybdenum

    Etching of Sc-AlN-doped

    Ukuchongwa okukhethiweyo kweSiGe

    Icala elingasemva le-wafer lincitshisiwe kwaye i-silicon ene-doped kakhulu ikhethwa ngokukhethiweyo

    Kwi-etching, umlinganiselo wokukhetha we-silicon oxide ukuya kwi-silicon nitride etching ingaphezulu kwama-200

    Kwi-etching, umlinganiselo wokukhetha we-silicon oxide ukuya kwi-aluminiyam ungaphezulu kwama-50

    Ulwelo lwe-Etching lunokungena kwimisele enzulu ukuze ikhuphe imidiya ye-silica abayifake kubunzulu obuthile

    Isango lesilicon oxide linokufakwa kwaye linokufaniswa kakuhle

    I-Photoresist diluent

    Lawula ukuvuselelwa kwe-bezel wafer

    Ukususwa kwentsalela ye-etching eyomileyo

    Ukucocwa kwentsalela ye-etching eyomileyo kwinkqubo ye-aluminiyam (>130nm)

    Ukucocwa kwentsalela eyomileyo kwinkqubo yobhedu (130nm-40nm)

    Inkqubo yobhedu: ukucocwa kwentsalela eyomileyo ngeTiN imaski (40nm-12nm)

    Isetyenziselwa inkqubo ye-10nm yokucoca kunye nokususwa kwe-AlOx

    Ukususwa kwenkqubo yokunyusa ukukhanya

    Ukususwa kwenkqubo yokunyusa ukukhanya

    Ingcaciso yeMveliso

    Iikhemikhali eziqulunqiweyo ziqhele ukusetyenziswa ngeendlela ezahlukeneyo ekwenzeni iisekethe ezidibeneyo kunye neepaneli zokubonisa. Olunye usetyenziso oluqhelekileyo lubandakanya:

    Inkqubo yokufota:Iikhemikhali eziqulunqiweyo zingasetyenziselwa ukulungiselela i-photoresists ukuchaza izakhiwo ezintle kwiibhodi zeesekethe okanye iipaneli zokubonisa. Ezi khemikhali zidlala indima ephambili kwinkqubo ye-photolithography, inceda ukudala iipatheni ezichanekileyo kunye nezakhiwo.

    Ukucoca kunye nokususwa kweNtsalela:Iikhemikhali ezenziweyo zisetyenziselwa iinkqubo zokuvelisa ukucoca kunye nokususa iintsalela, ezifana neentsalela ze-organic kunye ne-inorganic eziveliswa ngexesha lemveliso.

    Ukusabela kweekhemikhali kunye nokubekwa:Amanye aMichiza aYilwayo anokusetyenziswa kwiintlobo ezahlukeneyo zeekhemikhali kunye neenkqubo zokubeka, ezifana nokulungisa iileya ezisebenzayo kunye ne-conductivity ethile okanye iimpawu ezibonakalayo.

    Qinisekisa umgangatho wemveliso kunye nokungaguquguquki:Imichiza eyenziweyo ingasetyenziselwa ukuqinisekisa umgangatho wemveliso kunye nokuhambelana, umzekelo ngokulawula unyango oluphezulu kunye neemeko zenkqubo.

    Xa usebenza kunye neMichiza eyakhiweyo, iinkqubo zokusebenza ezikhuselekileyo kufuneka zilandelwe ngokungqongqo kwaye ukuphathwa kunye nokulahlwa kufuneka kuqhutywe kwindawo efanelekileyo.

    Kwinkqubo yokwenziwa kwecandelo lombane, iikhemikhali zodidi lwe-IC zihlala zinezi mfuno zilandelayo:
    Ukucoceka okuphezulu:Iikhemikhali zodidi lwe-IC kufuneka zibe nobunyulu obuphezulu kakhulu ukuqinisekisa ukuba akukho kungcola okanye ungcoliseko olwaziswayo ngexesha lenkqubo yokuvelisa. Ezi khemikhali kufuneka ziveliswe ngokweemfuno ezingqongqo zococeko kwaye zilandele iinkqubo ezingqongqo zokucoca kunye novavanyo.

    Intsalela ye-ionic ephantsi:Iikhemikhali zodidi lwe-IC kufuneka zibe nentsalela ye-ionic ephantsi njengoko umxholo we-ion ophezulu unokuchaphazela kakubi ukusebenza kwamalungu e-elektroniki. Ngoko ke, amanyathelo ahlala ethathwa ngexesha lenkqubo yokuvelisa ukunciphisa i-ionic carryover. 

    Umxholo wentsalela ephantsi:Iikhemikhali ze-IC-grade kufuneka zibe ne-residue content content ukuphepha ukushiya naluphi na ukungcola ngexesha lenkqubo yokuvelisa eya kuchaphazela ukusebenza kwesekethe okanye ukuzinza.
    Iimpawu ezichanekileyo zeekhemikhali:Iikhemikhali ze-IC-grade kufuneka zibe neempawu zeekhemikhali ezizinzile, kwaye ukubunjwa kwazo kufuneka kulawulwe ngokungqongqo kwaye kuqinisekiswe ukuqinisekisa ukuba ziyahlangabezana neemfuno ngexesha lenkqubo yokuvelisa.

    Ukuthobela imigangatho efanelekileyo:Ukuveliswa kunye nokusetyenziswa kweekhemikhali ze-IC-grade kufuneka zihambelane nemigangatho efanelekileyo yoshishino kunye nemimiselo yokuqinisekisa umgangatho wemveliso kunye nokhuseleko.
    Xa usebenzisa iikhemikhali zeKlasi ye-IC, abavelisi balawula ngokungqongqo imithombo yabo, bamkele iindlela ezifanelekileyo zokugcina kunye nokuphatha, kwaye baqinisekise ukuba abaqhubi baqeqeshwe ngokufanelekileyo.

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